Klorin trifluorida
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| Nama | |||
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| Nama IUPAC (sistematis)
Trifluoro-λ3-chlorane[1] (substitutive) | |||
| Nama lain
Chlorotrifluoride
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| Penanda | |||
Model 3D (JSmol)
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| 3DMet | {{{3DMet}}} | ||
| ChEBI | |||
| ChemSpider | |||
| Nomor EC | |||
| Referensi Gmelin | 1439 | ||
| MeSH | chlorine+trifluoride | ||
PubChem CID
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| Nomor RTECS | {{{value}}} | ||
| Nomor UN | 1749 | ||
CompTox Dashboard (EPA)
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| Sifat | |||
| ClF3 | |||
| Massa molar | 92,45 g·mol−1 | ||
| Penampilan | Colorless gas or greenish-yellow liquid | ||
| Bau | sweet, pungent, irritating, suffocating[2][3] | ||
| Densitas | 3.779 g/L[4] | ||
| Titik lebur | −7.634 °C (−13.709 °F; −7.361 K)[4] | ||
| Titik didih | 1.175 °C (2.147 °F; 1.448 K)[4] (decomposes @ 180 °C (356 °F; 453 K)) | ||
| Exothermic hydrolysis[5] | |||
| Kelarutan | Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane.[5] Soluble in CCl4 but can be explosive in high concentrations. | ||
| Tekanan uap | 175 kPa | ||
| -26.5·10−6 cm3/mol[6] | |||
| Viskositas | 91.82 μPa s | ||
| Struktur | |||
| T-shaped | |||
| Termokimia[7] | |||
| Kapasitas kalor (C) | 63.9 J K−1mol−1 | ||
| Entropi molar standar (S |
281.6 J K−1mol−1 | ||
| Entalpi pembentukan standar (ΔfH |
−163.2 kJ mol−1 | ||
| Energi bebas Gibbs (ΔfG) | −123.0 kJ mol−1 | ||
| Bahaya | |||
| Bahaya utama | explosive when exposed to organics, reacts violently with water[3] | ||
| Lembar data keselamatan | natlex.ilo.ch | ||
| Piktogram GHS |    
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| Keterangan bahaya GHS | {{{value}}} | ||
| Titik nyala | noncombustible [3] | ||
| Dosis atau konsentrasi letal (LD, LC): | |||
LC50 (konsentrasi median)
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95 ppm (rat, 4 hr) 178 ppm (mouse, 1 hr) 230 ppm (monkey, 1 hr) 299 ppm (rat, 1 hr) [8] | ||
| Batas imbas kesehatan AS (NIOSH): | |||
PEL (yang diperbolehkan)
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C 0.1 ppm (0.4 mg/m3)[3] | ||
REL (yang direkomendasikan)
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C 0.1 ppm (0.4 mg/m3)[3] | ||
IDLH (langsung berbahaya)
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20 ppm[3] | ||
| Senyawa terkait | |||
Senyawa terkait
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Chlorine pentafluoride Chlorine monofluoride | ||
Kecuali dinyatakan lain, data di atas berlaku pada suhu dan tekanan standar (25 °C [77 °F], 100 kPa). | |||
 verifikasi (apa ini   ?)
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| Referensi | |||
Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF3. Senyawa ini berwujud gas tak berwarna, beracun, korosif, dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF3 berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket, berbagai proses di industri semikonduktor,[9][10][11] pengolahan bahan bakar nuklir,,[12] serta proses-proses industri lainnya.[13]
Referensi
[sunting | sunting sumber]- ^ "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011.
- ^ ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.
- ^ a b c d e f "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH).
- ^ a b c Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9.
- ^ a b Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine. at Guidechem Chemical Network
- ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9.
- ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9.
- ^ "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH).
- ^ Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.
- ^ Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"
- ^ Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4.
- ^ Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9. (available from National Academies Press
)
- ^ Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"
