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"CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on ..."

Clemens Mart et al. (2018)

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DOI: 10.1109/ESSDERC.2018.8486864

access: closed

type: Conference or Workshop Paper

metadata version: 2021-04-20

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  dblp key:
  - conf/essderc/MartWCRZK18
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  - https://dblp.org/rec/conf/essderc/MartWCRZK18
Clemens Mart, Wenke Weinreich, Malte Czernohorsky, Stefan Riedel, S. Zybell, Kü Kuhnel:
CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures. ESSDERC 2018: 130-133

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