default search action

combined dblp search
author search
venue search
publication search

ask others

"Fast and accurate proximity effect correction algorithm based on pattern ..."

Wenze Yao et al. (2023)

> Home

Details and statistics

DOI: 10.1016/J.MEJO.2023.105718

access: closed

type: Journal Article

metadata version: 2023-05-01

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mj/YaoXZTL23
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mj/YaoXZTL23
Wenze Yao, Hongcheng Xu, Haojie Zhao, Ming Tao, Jie Liu:
Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography. Microelectron. J. 133: 105718 (2023)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.