default search action

combined dblp search
author search
venue search
publication search

ask others

"Investigation on negative capacitance FinEFT beyond 7 nm node from device ..."

Jiali Huo et al. (2021)

> Home

Details and statistics

DOI: 10.1016/J.MEJO.2021.105196

access: closed

type: Journal Article

metadata version: 2022-10-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mj/HuoHZZGHCZLZYW21
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mj/HuoHZZGHCZLZYW21
Jiali Huo, Weixing Huang, Fan Zhang, Shengli Zhang, Weizhuo Gan, Qiang Huo, Yuwei Cai, Qingzhu Zhang, Yongliang Li, Huilong Zhu, Huaxiang Yin, Zhenhua Wu:
Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit. Microelectron. J. 116: 105196 (2021)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.