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"Reliability on EUV Interconnect Technology for 7nm and beyond."

Tae-Young Jeong et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9129318

access: closed

type: Conference or Workshop Paper

metadata version: 2020-11-24

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  dblp key:
  - conf/irps/JeongLJKKY0CKJJ20
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  persistent URL:
  - https://dblp.org/rec/conf/irps/JeongLJKKY0CKJJ20
Tae-Young Jeong, Miji Lee, Yunkyung Jo, Jinwoo Kim, Min Kim, Myungsoo Yeo, Jinseok Kim, Hyunjun Choi, Joosung Kim, Yoojin Jo, Yongsung Ji, Taiki Uemura, Hai Jiang, Dongkyun Kwon, HwaSung Rhee, Sangwoo Pae, Brandon Lee:
Reliability on EUV Interconnect Technology for 7nm and beyond. IRPS 2020: 1-4

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