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"Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D ..."

Yusuke Higashi et al. (2024)

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DOI: 10.1109/IRPS48228.2024.10529409

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-29

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  dblp key:
  - conf/irps/HigashiBCBARRJBR24
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  - https://dblp.org/rec/conf/irps/HigashiBCBARRJBR24
Yusuke Higashi, J. P. Bastos, Adrian Vaisman Chasin, Laurent Breuil, Antonio Arreghini, S. Ramesh, S. Rachidi, Y. Jeong, Geert Van den Bosch, Maarten Rosmeulen:
Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and Endurance. IRPS 2024: 1-6

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