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"Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI."

K. R. Khiangte Amlta et al. (2018)

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DOI: 10.1109/DRC.2018.8442170

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-01

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  dblp key:
  - conf/drc/AmltaLMG18
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  - https://dblp.org/rec/conf/drc/AmltaLMG18
K. R. Khiangte Amlta, A. Laha, S. Mahapatra, U. Gangway:
Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI. DRC 2018: 1-2

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