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Andrew R. Neureuther
Person information
- affiliation: University of California, Berkeley, USA
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2010 – 2019
- 2010
- [c4]Lynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic
:
Parameter-specific ring oscillator for process monitoring at the 45 nm node. CICC 2010: 1-4
2000 – 2009
- 2008
- [c3]Jae-Seok Yang, Andrew R. Neureuther:
Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner. ISQED 2008: 352-356 - 2004
- [c2]Frank Gennari, Andrew R. Neureuther:
A Pattern Matching System for Linking TCAD and EDA. ISQED 2004: 165-170
1990 – 1999
- 1995
- [j9]Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther:
Massively parallel electromagnetic simulation for photolithographic applications. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 14(10): 1231-1240 (1995) - 1994
- [j8]Edward W. Scheckler, Andrew R. Neureuther:
Models and algorithms for three-dimensional topography simulation with SAMPLE-3D. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 13(2): 219-230 (1994) - [j7]Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler:
Algorithms for simulation of three-dimensional etching. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 13(5): 616-624 (1994) - 1993
- [j6]Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther:
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 12(9): 1345-1356 (1993) - 1992
- [j5]Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton:
A utility-based integrated system for process simulation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 11(7): 911-920 (1992) - 1991
- [j4]Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther:
Massively parallel algorithms for scattering in optical lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 10(9): 1091-1100 (1991) - [j3]Alexander S. Wong, Andrew R. Neureuther:
The intertool profile interchange format: a technology CAD environment approach [semiconductor technology]. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 10(9): 1157-1162 (1991) - [c1]Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton:
Linking TCAD to EDA - Benefits and Issues. DAC 1991: 573-578
1980 – 1989
- 1988
- [j2]K. Lee, Andrew R. Neureuther:
SIMPL-2: (SIMulated Profiles from the Layout-Version 2). IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 7(2): 160-167 (1988) - [j1]Roberto Guerrieri, Andrew R. Neureuther:
Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 7(7): 755-764 (1988)
1960 – 1969
- 1966
- [b1]Andrew R. Neureuther:
Interaction of Modulated Electron Beams With Open Periodic Structures. University of Illinois Urbana-Champaign, USA, 1966
Coauthor Index
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